China High quality Titanium Silicon Sputtering Target Quotes, Factory, Manufacturers

Titanium Silicon Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Titanium Silicon Sputtering Targets are produced by powder metallurgy technology, they are widely used for depositing TiSiN thin film coating on cutting tools. As this thin films are extremely wear resistant even under high temperature, coated tools can work under high machining speeds even without using coolants, and can also machine very tough materials such as Nickel alloy and titanium alloys easily. This targets are suitable for reactive magnetron sputtering and arc ion plating machines.

With special annealing treatment, uniform and fine grain size, lower oxygen content, our customers can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

 

Features

Chemical Composition: TiSi 85/15at%, TiSi 80/20at%, TiSi 75/25at%, special composition can be customized

Segregation of weight: +/-0.5wt%

Available Purity: 2N5, 3N

Production Technology: powder metallurgy

Shapes: planar targets



Available targets / cathodes for tools coating application 

Target /cathode

Materials

Materials of Coating

Hardness Hv

Reaction atmosphere

Ti

TiN

2000

N2

Ti

TiCN

2480~2800

CH4+N2

Zr

ZrN

3000

N2

Zr

ZrCN

3200~3400

CH4+N2

TiAI

TiAIN

2400~2900

N2

AlCr

AlCrN

2400~3000

N2

Cr

CrN

1500

N2

Cr

CrCN

1500~2000

CH4+N2

Hf

HfN

2750

N2


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