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Copper Sputtering Target
Brand :Xinkang
Product origin :Hunan,China
Delivery time :1-3 weeks
Supply capacity :1-5 tons / month
Copper Sputtering Targets are produced by melting technology, it’s widely applied for semiconductor, decorative coating and advanced packing field. With up to 5N purity, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. We also produce pure copper C10200, and oxygen free copper C10100 backing plates for customers, the biggest length is up to 1600mm.
Features
Chemical Composition: pure Cu
Available Purity: 3N5, 4N, 5N
Production Technology: melting
Shapes: planar targets, rotary targets
Average Grain Size: < 100um
Certificate of analysis of 5N pure Copper sputtering target
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